Nikon is a recognized leader in semiconductor equipment, particularly for its advanced lithography systems. The Nikon NSR-2005 I10C Stepper represents a significant advancement in photolithography technology, designed for high-resolution, high-precision, and efficient integrated circuit (IC) production. This article provides a detailed examination of the NSR-2005 I10C, focusing on its specifications, operating principles, applications, advantages, and maintenance.
Technical Specifications
| Parameter | Details |
|---|---|
| Model | Nikon NSR-2005I10C I LINE STEPPER |
| Manufacturing Data | 1995 |
| Location | Japan |
| Electric Source | NEMA BOX For CVCF |
| Condition | ASIS |
| Chamber Type | Maker SENDAI (1995) S04 |
| Chamber Size | Body (1950mm) |
| Computer Type | NEST3 |
| HP Laser | 5517B |
| Lamp Power | 1.75 kW |
| LSA Laser | 5mW/10mW |
| Reticle Microscope | Fixed |
| Wafer Condition | Silicon |
| Wafer Size | Currently configured for 200mm |
| Chuck Type | Ring (Special) |
| OF Detection Type | Nikon Original Type |
| Wafer Loader Type | Type 1 |
| Wafer Type | Flat |
| Wafer Carrier Table | Right |
| Extra In-Line | No |
| Reticle Size | 6 inch |
| FIA/LIA | FLA (yes), LIA (no) |
| Reticle Library Type | Nikon |
| Main Slot | (O) Slot /13 |
| Exit LIB Slot | (O) Slot 13 |
| PPD/PD | PPD (no), PD (no) |
| Rack Type | Normal (Right) |
| SHRINC Type | 1 |
| Missing Parts | No |
Equipment Overview
The NSR-2005 I10C is utilized in the micro-lithography process for integrated circuit production. It projects the patterns formed on photomasks onto the wafer surface with high resolution and precision. Key features include:
- Automatic Wafer Transfer System
- Automatic Photomask Management System
- Programmable Photomask Aperture
- Automatic Focusing and Leveling
- Automatic Wafer and Mask Alignment
- Lens Magnification Control
- Automatic Light Control
- Graphic Auto-Optimization Design Calculation
- Fault Display and Alarm System
After loading the photomask and wafer into their respective transfer units, the NSR-2005 I10C automatically completes processes such as photomask and wafer exchange, alignment, focusing, and stepwise exposure according to pre-set data formats and timing.
Equipment Composition
-
1.Main Unit
- ・ Projection Lens
- ・ Illumination System
- ・ Automatic Focusing and Leveling System
- ・ Photomask Alignment System
- ・ Wafer Alignment System
- ・ Laser Interferometer Measurement System
- ・ X-Y Worktable
- ・ Holding Stage
- ・ Wafer Transfer System
- ・ Photomask Transfer System
- ・ Clean Chamber
-
2.Control Cabinet
- ・ Worktable Control Unit
- ・ Laser Interferometer Counter
- ・ Photomask Alignment Control Unit
- ・ Lens Control Unit
- ・ Wafer Transfer Control Unit
- ・ Power Control Unit
- ・ Photomask Transfer Control Unit
- ・ User Interface
- ・ Computer System
- ・ CRT (Monitor)
- ・ ITV Controller
Hardware and System Function Description
- The NSR-2005 I10C can successfully locate wafer notches with a single-layer stress of 300 MPa and a warpage within 150 µm, passing edge detection tests with no errors for up to 1,000 pieces.
- It features an automatic photomask ID recognition system that can bind with the recipe; if an incorrect mask is used, the system triggers an alarm to prevent errors.
- The device meets SECS/GEM standards for factory automation.
- After modification, the system is compatible with manual and automatic loading processes for both 6-inch and 8-inch substrates during lithography.
Operating Principles
The NSR-2005 I10C employs stepper lithography, a technique where the photomask is sequentially stepped across the wafer. The process begins with the application of a photoresist layer to the wafer surface. Using the stepper's optical system, the desired pattern from the photomask is projected onto the photoresist. This exposure creates a latent image that is later developed, revealing the intricate patterns required for device fabrication.
The NSR-2005 I10C incorporates advanced optical technologies, including a high numerical aperture (NA) lens system that enhances resolution and image fidelity. Additionally, the use of a closed-loop feedback system ensures precise control of the exposure process, contributing to its remarkable accuracy.
Advantages of the NSR-2005 I10C
The Nikon NSR-2005 I10C offers several advantages over its predecessors and competing models:
- Enhanced Resolution: Capable of printing smaller features, it addresses challenges from advanced process nodes.
- Increased Throughput: Optimized for high-volume production, it significantly reduces cycle times, making it cost-effective for manufacturers.
- Superior Image Quality: Advanced optical systems and precise alignment contribute to higher yields and lower defect rates.
Maintenance and Support
Regular maintenance is essential for optimal performance of the NSR-2005 I10C. Recommended practices include:
- Routine Calibration: Periodic calibration of optical components to maintain accuracy and resolution.
- Photoresist Management: Proper handling and storage of photoresist materials to avoid contamination.
- System Checks: Regular updates to firmware and software to maintain operational efficiency.
Nikon provides comprehensive support options, including technical assistance and training programs, to help operators maximize the system's capabilities.
Conclusion
The Nikon NSR-2005 I10C Stepper is a testament to Nikon's commitment to advancing semiconductor manufacturing technology. With its exceptional specifications and versatile applications, it meets the evolving demands of the industry. As semiconductor technology progresses, the NSR-2005 I10C will remain a critical tool in the pursuit of higher performance and efficiency.
