1. Introduction to the Nikon NSR S204 Stepper
The Nikon NSR S204 Stepper is one of the cornerstone optical lithography systems developed by Nikon Corporation, a global leader in precision imaging and semiconductor manufacturing technology.
Designed for 200mm (8-inch) wafer production, the NSR S204 has proven to be a reliable and high-performance solution for a wide range of applications — from mature-node semiconductor production to advanced MEMS and analog IC fabrication.
This model combines Nikon’s renowned optical precision, stage accuracy, and long-term system stability, making it an excellent choice for fabs aiming to balance cost efficiency with production consistency. Many semiconductor manufacturers and R&D labs continue to rely on the S204 platform due to its outstanding exposure quality and maintainability.
2. Technical Specifications and Core Features
The following table summarizes the core technical parameters of the Nikon NSR S204 Stepper, offering a concise view of its performance range and optical system design.
| Parameter | Specification |
|---|---|
| Wafer Size | 200 mm (8-inch) |
| Resolution | Approx. 0.35 µm |
| Exposure Field Size | 22 mm × 22 mm |
| Overlay Accuracy | ≤ ±0.10 µm |
| Throughput | Up to 90 wafers/hour (typical) |
| Alignment Method | Global alignment + enhanced field-by-field alignment |
| Reticle Size | 6-inch (standard) |
| Illumination System | Mercury lamp, uniform i-line illumination |
| Wafer Leveling | 3-point leveling, high-precision Z control |
| Stage System | Air-bearing stage with laser interferometer feedback |
| Environmental Control | Temperature-controlled chamber and vibration isolation |
| System Footprint | Approx. 3.5 m × 2.8 m |
3. System Architecture and Operation Principle
The Nikon NSR S204 is built on a step-and-repeat optical exposure architecture, a proven lithography design where the system projects a reticle pattern onto the wafer one die (or field) at a time, repeating the process across the entire wafer surface.
Operational Overview
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1. Wafer Loading:
Wafers are loaded onto a precision chuck equipped with temperature control and Z-axis leveling. -
2. Global Alignment:
The system aligns the wafer using fiducial marks, ensuring submicron positional accuracy. -
3. Exposure Process:
A high-intensity i-line (365 nm) light source passes through the reticle, and the projection lens transfers the pattern onto the wafer photoresist layer. -
4. Step-and-Repeat Motion:
After each exposure, the stage moves to the next die location, repeating the projection with micron-level precision. -
5. Feedback and Correction:
Built-in sensors and interferometers provide real-time correction for vibration, thermal drift, and mechanical deviation.
Architecture Highlights
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Optical System: Nikon’s multi-element projection lens ensures superior image uniformity and minimal field distortion.
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Stage & Alignment System: Air-bearing X-Y stage with laser interferometer measurement allows nanometer-level repeatability.
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Vibration Isolation: The system chassis incorporates damping structures to minimize external vibrations.
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Cleanroom Integration: Designed for ISO Class 4–5 cleanroom environments, ensuring optimal process integrity.
4. Performance Advantages and Process Stability
The Nikon NSR S204 is widely recognized for its balance of precision, reliability, and productivity. Even after years of operation, properly maintained systems continue to achieve excellent overlay accuracy and pattern fidelity — making the S204 a benchmark among legacy 200mm steppers.
Key Performance Advantages
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Exceptional Overlay Accuracy — The S204 consistently maintains ≤ ±0.10 µm overlay across the wafer, even under extended production conditions.
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Stable Optical Performance — Nikon’s proprietary i-line projection lens delivers uniform illumination and low aberration, ensuring consistent critical dimension (CD) control.
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High Throughput Efficiency — With up to 90 wafers per hour, it supports medium-to-high volume fabs efficiently.
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Thermal and Vibration Control — The system includes active vibration damping and environmental control, improving exposure repeatability.
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Ease of Maintenance — Modular subsystems and accessible diagnostics allow for efficient preventive maintenance and reduced downtime.
Process Stability in Long-Term Operation
| Factor | S204 Solution | Benefit |
|---|---|---|
| Optical Drift | Temperature-compensated optics | Maintains consistent CD uniformity |
| Stage Repeatability | Laser interferometer feedback | Reduces field-to-field overlay error |
| Focus Stability | Closed-loop Z control | Maintains resist thickness tolerance |
| Alignment | Field-by-field correction | Enhances yield for multi-layer processes |
5. Common Applications and Industry Use Cases
While originally designed for mainstream logic and memory production at mature process nodes (0.5–0.25 µm), the Nikon NSR S204 remains a versatile and valuable platform in today’s semiconductor and MEMS industries.
Typical Applications
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MEMS Fabrication: Excellent for micro-electromechanical device layers where i-line resolution suffices.
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Power Devices: Ideal for power ICs and discrete devices requiring large patterns and thick resist.
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Analog & Mixed-Signal ICs: Stable overlay enables reliable multilayer analog device production.
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Sensor Manufacturing: Extensively used for CMOS image sensors and photodiode patterning.
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R&D and University Labs: Provides affordable, precise exposure for process development and mask testing.
Why Many Fabs Still Use NSR S204
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Proven long-term reliability and low maintenance costs.
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Easy integration with existing 200mm process lines.
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Available spare parts and technical support through secondary market suppliers.
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Consistent process control even under varied photoresist or substrate conditions.
6. Comparison: NSR S204 vs. Newer Nikon Steppers (S205, S206D)
For engineers and procurement specialists evaluating Nikon steppers, understanding how the NSR S204 compares to newer models (such as S205 and S206D) helps determine the best fit for their production needs.
| Feature | NSR S204 | NSR S205 | NSR S206D |
|---|---|---|---|
| Wafer Size | 200 mm | 200 mm | 200 mm |
| Resolution | 0.35 µm | 0.30 µm | 0.25 µm |
| Throughput | 90 WPH | 95 WPH | 100+ WPH |
| Overlay Accuracy | ±0.10 µm | ±0.08 µm | ±0.07 µm |
| Control System | Legacy Nikon software | Enhanced stage control | Advanced auto-calibration |
| Maintenance Cost | Low | Moderate | High |
| Typical Market | Mature-node fabs, MEMS | Power/Analog ICs | Advanced R&D, precision MEMS |
7. Maintenance, Refurbishment, and Serviceability
Although the Nikon NSR S204 is a mature-generation stepper, its robust design allows for long operational life — provided that routine maintenance and professional refurbishment are carried out. Many secondary fabs and service centers continue to support the S204 with strong aftermarket expertise.
Maintenance Best Practices
To ensure the S204 remains reliable and precise, fabs typically follow these maintenance standards:
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Optical System Cleaning: Regular inspection and cleaning of lenses and mirrors prevent contamination-related focus errors.
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Stage Calibration: Monthly checks of X–Y and Z-stage alignment using certified interferometers ensure overlay accuracy.
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Environmental Control: Maintain cleanroom class (Class 1000 or better) and stable temperature (±0.1°C) to minimize drift.
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Lamp Replacement: Replace exposure lamps before degradation affects illumination uniformity.
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Software Backup: Regularly archive recipes and alignment parameters to prevent data loss during updates.
Refurbishment Process
| Refurbishment Step | Procedure | Purpose |
|---|---|---|
| System Inspection | Full mechanical & electrical evaluation | Identify aging components |
| Optical Reconditioning | Recoat or replace lenses/mirrors | Restore original resolution |
| Motion System Overhaul | Replace bearings, lubricants | Recover stage repeatability |
| Controller Upgrade | Replace worn boards, test firmware | Improve stability |
| Final Qualification | Test wafers & focus uniformity | Certify performance post-refurbishment |
Refurbished NSR S204 units, when properly serviced, can match 90–95% of the original factory performance at a fraction of the new system’s cost — making them an ideal investment for 200mm fabs or universities expanding process capabilities on limited budgets.
8. Why Choose a Trusted Used Nikon Stepper Supplier
With global demand for legacy 200mm production continuing to rise — particularly for MEMS, power, and analog ICs — choosing a reliable secondary equipment partner has never been more critical.
At JunR Semiconductor Equipment Co., Ltd. (www.junr.com.cn), we specialize in the sourcing, refurbishment, and resale of used Nikon steppers, including the NSR S204, S205, and S206D models.
Our Competitive Advantages
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✅ Extensive Inventory: Multiple Nikon stepper models in stock, tested and qualified.
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✅ Technical Expertise: Experienced engineers for installation, calibration, and training.
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✅ Global Sourcing Network: Partnerships across Japan, Korea, and the U.S. to ensure authentic, fully functional units.
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✅ Custom Refurbishment: Each system is evaluated, refurbished, and qualified according to customer process requirements.
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✅ After-Sales Support: Spare parts, on-site assistance, and remote diagnostics.
Customer Benefits
| Feature | Your Advantage |
|---|---|
| Cost Efficiency | Up to 70% savings compared with new systems |
| Fast Delivery | Immediate availability of refurbished units |
| Process Compatibility | Integration-ready with existing 200mm lines |
| Long-Term Reliability | Guaranteed performance through full inspection |
| Technical Support | Local engineers + remote diagnostic assistance |
Conclusion:
The Nikon NSR S204 Stepper remains a high-value solution for semiconductor manufacturers balancing precision, throughput, and affordability. When acquired through a qualified secondary supplier like JunR, it delivers proven Nikon quality — revitalized for today’s cost-conscious production needs.





