Nikon i9 vs i10 Stepper – Detailed Comparison, Specs, and Applications

Introduction

In semiconductor manufacturing, photolithography is a core technology that defines circuit patterns on wafers. The precision, stability, and repeatability of steppers (or step-and-repeat lithography systems) directly influence yield, overlay accuracy, and overall device performance. Among Nikon’s legacy lithography platforms, the Nikon i9 and Nikon i10 steppers are historically significant and widely used in both production and engineering environments.

This article provides a professional and comprehensive analysis of Nikon i9 vs i10 steppers, explaining their architecture, technical differences, application scenarios, and support considerations. Though both systems are older compared to modern scanners, they remain important in mature-node production, test labs, and specialized applications.

What Is a Nikon Stepper?

A Nikon stepper is an optical projection lithography system that transfers a pattern from a photomask onto a semiconductor wafer one field at a time. It uses a laser or broadband light source and high-precision optics to ensure accurate reproduction of circuit features.

Steppers like the i9 and i10 step-and-repeat systems are known for:

• ● High optical resolution

• ● Stable mechanics

• ● Robust motion control

• ● Ease of integration with test and monitoring systems

They are often used where tight overlay control and positional precision are required.

Nikon i9 vs i10 Stepper – Technical Comparison

Below is a side-by-side comparison of the two Nikon stepper platforms:

Notes: Details vary by specific configuration and installed modules. Photomask type (G-Line vs I-Line) and reticle reduction optics strongly influence achievable resolution.

Key Technical Differences

1. Optical and Resolution Enhancements

• ● i9: Designed during a period when G-Line and basic I-Line optics dominated. Resolution targets were calibrated for feature sizes of older technology nodes.

• ● i10: Often equipped with refined I-Line optics and improved lens coatings, which provide better image contrast and tighter feature control.

2. Stage and Motion Control

The i10 series generally incorporates more advanced linear stages, offering better positional repeatability. This reduces overlay error—a critical metric when layers are stacked in multi-layer devices.

3. Service and Support Architecture

Because the i10 was introduced later in Nikon’s product line, it benefits from more recent motion control electronics and interface systems, making system integration and remote diagnostics more effective.

Typical Applications of Nikon i9 and i10 Steppers

Despite being older platforms, both steppers remain useful in several environments:

Mature-Node Production

• ● Legacy logic nodes

• ● Power device lines

• ● MEMS fabrication where extreme resolution is not necessary

R&D and Process Development

• ● Prototype wafer patterning

• ● Mask evaluation

• ● Exposure modeling

Test, Inspection, and Engineering Validation

• ● Integration with probe testing (e.g., wafer probers)

• ● Overlay and alignment studies

• ● Yield monitoring for mature technologies

These use cases demonstrate that while next-generation scanners dominate new technology nodes, i9 and i10 steppers continue to play roles where their balance of precision, reliability, and cost effectiveness is appropriate.

System Architecture and Components

Both Nikon i9 and i10 stepper systems share a modular architecture composed of:

1. 1. Optical Projection Module
   Precision lenses and illumination systems that define imaging quality.

2. 2. Exposure Control Unit
   Manages dose, shutter timing, and field positioning.

3. 3. Precision Motion Stages
   X-Y stage and Z focus control for wafer and reticle alignment.

4. 4. Alignment and Inspection Subsystems
   Uses camera feedback and alignment marks for accurate field placement.

   
   

5. 5. Control Electronics and Software
   Manages recipe execution, stage control, and test integration interfaces.

High uptime and repeatability stem from careful calibration of these modules and a robust motion control backbone.

Accessories and Spare Parts

Long-term operation of Nikon i9 or i10 steppers requires maintenance and occasional replacement of components, including:

• ● Optical lenses and filters

• ● Stage motors and linear encoders

• ● Reticle clamps and wafer chucks

• ● Light sources and illumination optics

• ● Motion controller boards and power modules

• ● Cooling and environmental control systems

Consistent part availability and qualification are key to minimizing unscheduled downtime.

Integration with Test and Production Systems

Nikon i9 and i10 steppers can interface with:

• ● Wafer probers for post-exposure test analysis

• ● Metrology systems for overlay measurement

• ● Factory automation for wafer handling

The ability to integrate with external equipment increases their utility in mixed-generation fabs.

System Maintenance and Lifecycle Considerations

Given the age of these platforms, operators should focus on:

• ● Preventive maintenance schedules

• ● Strategic parts inventory

• ● Calibration of alignment optics

• ● Motion stage refurbishment when necessary

This helps extend usable life and ensures consistent output quality even as newer tools enter the factory floor.

Conclusion

The Nikon i9 vs i10 stepper comparison highlights both the legacy value and technical evolution within Nikon’s step-and-repeat lithography family. The i10 generally offers refined optics, better motion control, and higher overlay accuracy, while the i9 continues to serve well in mature-node environments where its capability remains sufficient.

Understanding the differences, system architecture, and lifecycle support needs allows engineers and equipment planners to make informed decisions when managing mixed fleets of photolithography equipment.

As a professional supplier specializing in Nikon i9 stepper and i10 stepper systems, including complete machines and spare parts, we provide technically verified equipment and practical support insights to help maintain stable lithography operations and maximize the long-term value of existing tools.